Behind the Mask 2025 Art Competition – Ten Moir Gallery

a mask with the words behind the mask online open call in white

Ten Moir Gallery invites artists and photographers to explore the theme “Behind the Mask”—delving into hidden truths, layered identities, and untold stories through their creative lens. This online exhibition challenges participants to uncover the unseen, celebrate vulnerability, and reveal what lies beyond the surface.

Submissions are open to artists worldwide, and the Best in Show winner will receive:

  • cash prize,
  • Free entry into the Blu Sky Artist Award,
  • Feature as the poster artwork for the exhibition, and more!

All winning artists will receive a digital award certificate as recognition of their achievement.

Entry Fee: $12 per submission
Deadline: March 31, 2025

Embrace the mystery and share your vision Behind the Mask.

Learn more and Apply here: https://tenmoirgallery.com/hyw0